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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials



Electron-Beam Lithography
(Royce EBL Suite, Class 100 CGC Cleanroom)


Model: EBPG 5200, Raith GMBH

Principal User: Dr Matteo Tiberi

Deputy UserDr Yang Li

The EBPG5200 is a high performance nanolithography system with full 200 mm writing capability. This Electron Beam Lithography system presents a further evolutionary stage of the highly successful and field-proven EBPG series. It offers a wide range of leading edge solutions for both direct write nanolithography and R&D mask making in universities and commercial centers of excellence.

  1. Highest resolution
  2. Unparalleled automatic calibration and job execution
  3. High current density Thermal Field Emission gun for operation at 20, 50 and 100 kV
  4. 200 mm platform for up to 8 inch wafer and 7 inch masks
  5. Minimum feature size of less than 8 nm
  6. Continuously variable field size up to 1 mm at all kVs
  7. GUI for for multi-user environment

Starlab - RF Antennae characterisation system
(EEDB, Lab 32)

MVG, range 650 to 18 000 MHz


Principal User: Dr Xiao Zhang

Deputy UserDr Boyang Mao

StarLab is the ultimate tool for antenna pattern measurements in laboratories and production environments where space is limited, cost is critical, and the flexibility of a portable system is required.

  • Near-field / Spherical Near-field / Cylindrical
  • Cross polar discrimination, Sidelobe levels, 3D radiation pattern, radiation pattern in any polarization (linear or circular)
  • Antenna efficiency, TRP, TIS, EIRP and EIS
  • Frequency bands:  StarLab 18 GHz: 650 MHz to 18 GHz
  • Max. size of DUT: 45 cm for spherical set-up
  • 2.7 m x 45 cm for cylindrical set-up
  • Specific lengths available upon request
  • Max. weight of DUT: 10 kg with styrofoam mast
  • 15 kg with heavy DUT mast
  • Typical dynamic range: 650 MHz - 6 GHz: 70 dB, 6 GHz - 18 GHz: 60 dB
  • Oversampling,  Arch rotation