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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials

Studying at Cambridge

 

CGC Class 1000 Cleanroom

Below, you can find the list of equipment available in Class 1000 Cleanroom. A few are already available for use, others are being installed and will become available later.

Please use the booking system to use the equipment.

 

Plasma-Enhanced Chemical Vapour Deposition system (PE-CVD)


Model: Vision 310, Advanced Vacuum AB

(will be available in November 2017)


Used for plasma-enhanced chemical vapour deposition system is used for depositing amorphous Si, SiO2 and Si3N4.
Gases connected: SiH4, NH3, N2O, N2

Available processes:
1. Under construction

Reactive Ion Etcher (RIE)


Model: Vision 320, Advanced Vacuum AB

(will be available in November 2017)


Used for reactive-ion etching of Si, SiO2 and Si3N4.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

Available processes:
1. Under construction

Inductively-Coupled Reactive Ion Etcher (ICP-RIE) “APEX”


Model: APEX SLR, Advanced Vacuum AB

(will be available in November 2017)


A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

Available processes:
1. Under construction

Inductively-Coupled Reactive Ion Etcher (ICP-RIE) “Oxford”


Model: PlasmaLab 100, Oxford Instruments

(will be available in November 2017)

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

Available processes:
1. Under construction

Reactive Ion Etcher “NanoEtch”


Model: NanoEtch, Moorfiend Nanotechnology Ltd

Available for use


The tool implements a unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package.
Gases connected: CF4, O2, Ar, N2

Available processes:
1. Under construction

Plasma Cleaner “Femto”


Model: Femto, Diener Electronics GmbH.


(will be available in September 2017)

 

This is a low-pressure plasma system used for plasma cleaning of substrates and activating surfaces.

Gases connected: O2, N2

Available processes:
1. Under construction

Electron-Beam Evaporator/Sputterer


Model: PVD 200 Pro, Kurt J. Lesker

(will be available in November 2017)


This PVD tool is used for e-beam evaporation and sputter deposition of metals dielectrics.
Materials: Au, Ag, Cu, Cr, Ti, Al, Ni, Sn, Mo, ITO, SiO2, Al2O3

Thermal Evaporator


Model: MiniLab 60, Moorfield Nanotechnology Ltd

Available for use.

Features: Manual and Automatic process modes, HMI, used for a thermal evaporation of selected metals.
Materials: Au, Ag, Cr, Al

Atomic Layer Deposition (ALD)


Model: TFS200, Beneq

(will be available in November 2017)

Used for Atomic Layer Deposition of Al2O3 and TiO2.

Materials: liquid TMA and TiCl4 precursors

Ar-filled Glovebox

Model: MBraun

Available for use.


Inert-atmosphere (Ar) glovebox with a robotized 3D graphene transfer system and a thermal evaporator. The thermal evaporator can be accessed from the inside as well as outside of the glovebox. There is a spinner and a hotplate inside.

Transition-Metal Dichalcogenides Chemical Vapour Deposition system (TM-CVD)


Model: Planartech

(will be available in September 2017)

 

A dual-furnace Chemical Vapour Deposition system for growth of 2D materials.

Plasma-Enhanced Graphene Chemical Deposition system (PE-G-CVD)

Model: Planartech

(will be available in September 2017)

Plasma-Enhanced Chemical Vapour Deposition system for growth of high-quality graphene.

Graphene Transfer System

Available for use.

The tool is equipped with micro-manipulators and is based on Nikon Eclipse microscope

Tube Furnaces - x3

Model: MTI GTF-1200X

 

(will be available in October 2017)

 

Available processes:

1. Under construction

Acid Bench

This wetbench is used for graphene transfer, cleaning, and a number of other processes involving acids.

Available for use.

Solvent Bench

This wetbench is used for cleaning, preparation of samples for deposition, etching, as well as any other operations requiring solvents.

Available for use.