CGC Class 1000 Cleanroom
Below, you can find the list of equipment available in Class 1000 Cleanroom. A few are already available for use, others are being installed and will become available later.
Please use the booking system to use the equipment.
Plasma-Enhanced Chemical Vapour Deposition system (PE-CVD)Model: Vision 310, Advanced Vacuum AB The plasma-enhanced chemical vapour deposition system is used for depositing amorphous Si, SiO2 and Si3N4. Users in Charge: Leader: Mr Petros Symeon Technical support: Lee Robinson |  |
Reactive Ion Etcher (RIE-AV)Model: Vision 320, Advanced Vacuum AB Used for reactive-ion etching of Si, SiO2 and Si3N4. Users in Charge: Leader: Dr Chao Wen |  |
Inductively-Coupled Reactive Ion Etcher (RIE-ICP-AV) Model: APEX SLR, Advanced Vacuum AB A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity. Users in Charge: Leader: Dr Chao Wen Deputy: Dr Dharmaraj Periyanagounder |  |
Reactive Ion Etcher (RIE-Nano) Model: NanoEtch, Moorfield Nanotechnology Ltd The tool implements a unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package. Users in Charge: Leader: Dr Dharmaraj Periyanagounder Deputy: Ms Lu Chen |  |
Sputter-Coater (Spuco) Model: NanoPVD, Moorfield Nanotechnology Ltd Moorfield NanoPVD is used for sputter-coating various metals and dielectrics. x1 DC + 2x RF sources, magnet pack, 2" targets, up to 4" wafers, no heating. Materials: Au, Ni, Cr, SiO2. Others are available upon request. Gases connected: O2, Ar, N2 Users in Charge: Leader: Ms Sohail Abbas Deputy: Dr Yang Li |  |
Plasma Cleaner (RIE-Femto) Model: Femto, Diener Electronics GmbH This is a low-pressure plasma system used for plasma cleaning of substrates and activating surfaces. Gases connected: O2, N2 Users in Charge: Leader: Dr Dharmaraj Periyanagounder Deputy: Ms Sohail Abbas |  |
Electron-beam Evaporator (Evap-LEV) Model: PVD 200 Pro, Kurt J. Lesker This PVD tool is used for e-beam evaporation of metals and dielectrics. Users in Charge: Main: Dr Yang Li Deputy: Dr Chao Wen |  |
Electron-beam Evaporator (Evap-IndEV) Model: Nexdep, Angstrom Engineering This PVD tool is used for low-melting-point metals as well as general materials for contact deposition. Users in Charge: Leader: Dr Han Yan (hy346@cam.ac.uk) Deputy: Dr Dharmaraj Periyanagounder |  |
Thermal Evaporator (Evap-TEV) Model: MiniLab 60, Moorfield Nanotechnology Ltd Manual and Automatic process modes, HMI, used for the thermal evaporation of selected metals. Users in Charge: Leader: Dr Dharmaraj Periyanagounder |  |
Plasma-Enhanced Atomic Layer Deposition (PE-ALD)Model: Fiji, Veeco Used for Plasma-Enhanced Atomic Layer Deposition of Al2O3, TiO2, HfO2 Users in Charge: Deputy: Ms Lu Chen |  |
Ar-filled Glovebox (Evap-GB + Robot-GB)Model: M-Braun Inert-atmosphere (Ar) glovebox with a robotised 3D graphene transfer system and a thermal evaporator. The thermal evaporator can be accessed from the inside as well as outside of the glovebox. There is a spinner and a hotplate inside. Users in Charge: Leader: Dr Yang Li Deputy: Mr Sohail Abbas |  |
Graphene Chemical Vapour Deposition (CVD-G)Model: Graphene Square This chemical vapour deposition system is used to produce graphene films. Users in Charge: Leader: Dr Dharmaraj Periyanagounder |  |
Transition-Metal Dichalcogenides Chemical Vapour Deposition (CVD-TMD) Model: PlanarGROW-2S A Dual-Furnace Chemical Vapour Deposition system for growth of 2D transition-metal dichalcogenides (WS, WSe2). Users in Charge: Leader: Dr Dharmaraj Periyanagounder Deputy: Ms Lu Chen |  |
Plasma-Enhanced Chemical Vapour Deposition - Graphene (PE-CVD-G) Model: PlanarGROW-4S Plasma-Enhanced Chemical Vapour Deposition system for the growth of high-quality graphene. Users in Charge: Leader: Dr Dharmaraj Periyanagounder Deputy: Ms Lu Chen |  |
Boron-Nitride Chemical Vapour Deposition (CVD-hBN)Model: Planartechh-BN Chemical Vapour Deposition system for growth of Boron Nitride film Users in Charge: Leader: Dr Dharmaraj Periyanagounder Deputy: Ms Lu Chen |  |
Transfer System x2 Model: Nikon Eclipse LV200 The tool is equipped with micro-manipulators and is based on a Nikon Eclipse microscope Users in Charge: Leader: Dr Chao Wen Deputy: Mr Sohail Abbas |  |
Furnace Tube – Ar/H2, N2/H2 Model: GTF-1200X Tube furnace for the annealing processes up to 1100C °C in the 95% Argon/ 5% Hydrogen atmosphere. Furnace Tube – O2 Annealing Model: GTF-1200X Tube furnace for the annealing processes up to 1100 °C in the Forming Gas atmosphere. Users in Charge: Leader: Dr Dharmaraj Periyanagounder |  |
Acid Bench This acid wet bench is used for graphene transfer, cleaning, and a number of other processes involving acids Users in Charge: Leader: Dr Dharmaraj Periyanagounder |  |
Solvent Bench This solvent bench is used for cleaning, preparation of samples for deposition, etching, and any other operations requiring solvents. Users in Charge: Leader: Dr Dharmaraj Periyanagounder |  |
Vaccum OvenModel: xxxxxx descriptionxxxxxxx Users in Charge: Leader: xxxxx |
Aixtron CCS2D MOCVD (Awaiting commission)Model: CCS2D 19X2'' The Aixtron CCS2D MOCVD is a state-of-the-art metal-organic chemical vapour deposition system designed for wafer-scale growth of 2D materials and heterostructures. Featuring precise control over deposition parameters and compatibility, it enables high-quality, reproducible epitaxial films for advanced research and pilot-line production. Its unique close-coupled showerhead design ensures uniform gas distribution, making it ideal for synthesising materials like transition metal dichalcogenides on substrates such as silicon and sapphire Users in Charge: Leader: Dr Dharmaraj Periyanagounder |  |