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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials

Studying at Cambridge

 

CGC Class 1000 Cleanroom

Below, you can find the list of equipment available in Class 1000 Cleanroom. A few are already available for use, others are being installed and will become available later.

Please use the booking system to use the equipment.

 

Plasma-Enhanced Chemical Vapour Deposition system (PE-CVD)


Model: Vision 310, Advanced Vacuum AB


Used for plasma-enhanced chemical vapour deposition system is used for depositing amorphous Si, SiO2 and Si3N4.
Gases connected: SiH4, NH3, N2O, N2

Users in charge:

Dr Yury Alaverdyan - ya236

Reactive Ion Etcher (RIE)


Model: Vision 320, Advanced Vacuum AB


Used for reactive-ion etching of Si, SiO2 and Si3N4.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

Users in charge:

Dr Gyeong Park - gp440

Inductively-Coupled Reactive Ion Etcher (ICP-RIE) “APEX”


Model: APEX SLR, Advanced Vacuum AB


A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

Users in charge:

Dr Gyeong Park - gp440

Inductively-Coupled Reactive Ion Etcher (ICP-RIE) “Oxford”


Model: PlasmaLab 100, Oxford Instruments

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

Users in charge:

Dr Yury Alaverdyan - ya236

Reactive Ion Etcher “NanoEtch”


Model: NanoEtch, Moorfiend Nanotechnology Ltd


The tool implements a unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package.
Gases connected: CF4, O2, Ar, N2


Users in charge:

Dr Alisson Cadore - arc87

Plasma Cleaner “Femto”


Model: Femto, Diener Electronics GmbH.

This is a low-pressure plasma system used for plasma cleaning of substrates and activating surfaces.

Gases connected: O2, N2

Users in charge:

Dr Yury Alaverdyan - ya236

Electron-Beam Evaporator/Sputterer


Model: PVD 200 Pro, Kurt J. Lesker


This PVD tool is used for e-beam evaporation and sputter deposition of metals dielectrics.
Materials: Au, Ag, Cu, Cr, Ti, Al, Ni, Sn, Mo, ITO, SiO2, Al2O3

Users in charge:

Mr Giuseppe Russo (processtech@graphene.cam.ac.uk)

Thermal Evaporator


Model: MiniLab 60, Moorfield Nanotechnology Ltd

Features: Manual and Automatic process modes, HMI, used for a thermal evaporation of selected metals.
Materials: Au, Ag, Cr, Al

Users in charge:

Ms Hannah Watson - hfyw2

Dr Wenshan Li - wl364

Atomic Layer Deposition (ALD)


Model: TFS200, Beneq

Used for Atomic Layer Deposition of Al2O3 and TiO2.

Materials: liquid TMA and TiCl4 precursors

Users in charge:

Mr Yang Li - yl539

Ar-filled Glovebox

Model: M-Braun

Available for use.

Inert-atmosphere (Ar) glovebox with a robotized 3D graphene transfer system and a thermal evaporator. The thermal evaporator can be accessed from the inside as well as outside of the glovebox. There is a spinner and a hotplate inside.

Users in charge:

Dr Alisson Cadore - arc87

Dr Ioannis Paradeisanos - ip351

Transition-Metal Dichalcogenides Chemical Vapour Deposition system (TM-CVD)


Model: Planartech

A dual-furnace Chemical Vapour Deposition system for growth of 2D materials.

Users in charge:

Dr Osman Balci - ob325

Plasma-Enhanced Graphene Chemical Deposition system (PE-G-CVD)

Model: Planartech

(will be available in May 2018)

Plasma-Enhanced Chemical Vapour Deposition system for growth of high-quality graphene.

Users in charge:

Dr Osman Balci - ob325

Graphene Transfer Systems x2

Available for use.

The tool is equipped with micro-manipulators and is based on Nikon Eclipse microscope

Users in charge:

Dr Alisson Cadore - arc87

Dr Ioannis Paradeisanos - ip351

Tube Furnaces - x3

Model: MTI GTF-1200X

 

(will be available in May 2018)

 

Users in charge:

Dr Yury Alaverdyan - ya236

Acid Bench

This wetbench is used for graphene transfer, cleaning, and a number of other processes involving acids.

Available for use.

Solvent Bench

This wetbench is used for cleaning, preparation of samples for deposition, etching, as well as any other operations requiring solvents.

Available for use.