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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials
 

Below, you can find the list of equipment available in Class 1000 Cleanroom. A few are already available for use, others are being installed and will become available later.

Please use the booking system to use the equipment.

 

Plasma-Enhanced Chemical Vapour Deposition system (PE-CVD)

Model: Vision 310, Advanced Vacuum AB

 

The plasma-enhanced chemical vapour deposition system is used for depositing amorphous Si, SiO2 and Si3N4.
Gases connected: SiH4, NH3, N2O, N2

 

Users in Charge:

Leader: Dr Osman Balci
Deputy: Dr Sachin Shinde

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

 

 

Reactive Ion Etcher (RIE-AV)

Model: Vision 320, Advanced Vacuum AB

 

Used for reactive-ion etching of Si, SiO2 and Si3N4.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

 

Users in Charge:

Leader: Dr Adil Meersha
Deputy: Dr Subash Sharma

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Inductively-Coupled Reactive Ion Etcher (RIE-ICP-AV)

Model: APEX SLR, Advanced Vacuum AB

 

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials: 
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

 

Users in Charge:

Leader: Dr Adil Meersha

Deputy: Dr Ozan Aktas

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

Inductively-Coupled Reactive Ion Etcher (RIE-ICP-OX)

Model: PlasmaLab 100, Oxford Instruments

 

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO2 and Si3N4 with an enhanced rate and anisotropicity.
Gases connected: SF6, CHF3, C4F8, CF4, O2, Ar, N2
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO2, Si3N4 (exposed noble metal parts/masks are not allowed)

 

 

Users in Charge:

Leader: Dr Adil Meersha
Deputy: Dr Ozan Aktas

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Reactive Ion Etcher (RIE-Nano)

Model: NanoEtch, Moorfield Nanotechnology Ltd

 

The tool implements a unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package.
Gases connected: CF4, O2, Ar, N2

 

Users in Charge:

Leader: Dr Osman Balci

Deputy: Dr Sachin Shinde

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

Sputter-Coater (Spuco)

Model: NanoPVD, Moorfield Nanotechnology Ltd

 

Moorfield NanoPVD is used for sputter-coating various metals and dielectrics.

x1 DC + 2x RF sources, magnet pack, 2" targets, up to 4" wafers, no heating.

Materials: Au, Ni, Cr, SiO2. Others are available upon request.

Gases connected: O2, Ar, N2

 

 

Users in Charge:

Leader: Dr Sachin Shinde

Deputy: Dr Jincan Zhang

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Plasma Cleaner (RIE-Femto)

Model: Femto, Diener Electronics GmbH

 

This is a low-pressure plasma system used for plasma cleaning of substrates and activating surfaces.

Gases connected: O2, N2

 

Users in Charge:

Leader: Dr Osman Balci

Deputy: Dr Sachin Shinde

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Electron-beam Evaporator (Evap-LEV)

Model: PVD 200 Pro, Kurt J. Lesker

 

This PVD tool is used for e-beam evaporation of metals and dielectrics.
Materials: Au, Cr, Ti, Al, SiO2, Al2O3

 

Users in Charge:

Main: Dr Yang Li

Deputy: Dr Adil Meersha

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Electron-beam Evaporator (Evap-IndEV)

Model: Nexdep, Angstrom Engineering

 

This PVD tool is used for low-melting point metals as well as general materials for contacts' deposition.
Materials: In, Au, Pt, Pd, Ti

 

 

Users in Charge:

Leader: Dr Yan Wang

Deputy: Dr Adil Meersha

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

 

 

Thermal Evaporator (Evap-TEV)

Model: MiniLab 60, Moorfield Nanotechnology Ltd

 

Manual and Automatic process modes, HMI, used for a thermal evaporation of selected metals.
Materials: Au, Ag, Cr, Al

 

Users in Charge:

Leader: Dr Osman Balci
Deputy: Ms Hamideh Ramezani

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Plasma-Enhanced Atomic Layer Deposition (PE-ALD)

Model: Fiji, Veeco

 

 

Used for Plasma-Enhanced Atomic Layer Deposition of Al2O3, TiO2, HfO2

 

Users in Charge:

Leader: Dr Osman Balci

Deputy: Dr Yang Li

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

Atomic Layer Deposition (ALD)

Principal UserDr Yang Li

Deputy UserDr Osman Balci

Model: TFS200, Beneq

Used for Atomic Layer Deposition of Al2O3 and TiO2.

Materials: liquid TMA and TiCl4 precursors

 

 

Ar-filled Glovebox (Evap-GB + Robot-GB)

Model: M-Braun

 

Inert-atmosphere (Ar) glovebox with a robotized 3D graphene transfer system and a thermal evaporator. The thermal evaporator can be accessed from the inside as well as outside of the glovebox. There is a spinner and a hotplate inside.

 

Users in Charge:

Leader: Mr Hao Chen

Deputy: Dr Yang Li

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Graphene Chemical Vapour Deposition (CVD-G)

Model: Graphene Square

 

This chemical vapor deposition system is used to produce graphene films.

 

Users in Charge:

Leader: Dr Osman Balci
Deputy: Dr Sachin Shinde

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

Transition-Metal Dichalcogenides Chemical Vapour Deposition (CVD-TMD)

Model: PlanarGROW-2S

 

A Dual-Furnace Chemical Vapour Deposition system for growth of 2D transition-metal dichalcogenides (WS, WSe2).

 

 

Users in Charge:

Leader: Dr Sachin Shinde

Deputy: Dr Osman Balci

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

 

Plasma-Enhanced Chemical Vapour Deposition - Graphene (PE-CVD-G)

Model: PlanarGROW-4S

 

Plasma-Enhanced Chemical Vapour Deposition system for growth of high-quality graphene.

 

Users in Charge:

Leader: Dr Sachin Shinde

Deputy: Dr Osman Balci

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

Boron-Nitride Chemical Vapour Deposition (CVD-hBN)

Model: Planartech

 

h-BN Chemical Vapour Deposition system for growth of Boron Nitride film

 

Users in Charge:

Leader: Dr Osman Balci

Deputy: Dr Sachin Shinde

 

Technicians in charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

Transfer System x2

Model: Nikon Eclipse LV200

The tool is equipped with micro-manipulators and is based on Nikon Eclipse microscope

 

Users in Charge:

Leader: Dr Tanweer Ahmed

Deputy: Mr Hao Chen

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Furnace Tube – Ar/H2, N2/H2

Model: GTF-1200X

 

Tube furnace for the annealing processes up to 1100C in the 95% Argon/ 5% Hydrogen atmosphere.

 

Furnace Tube – O2 Annealing

Model: GTF-1200X

 

Tube furnace for the annealing processes up to 1100C in the Forming Gas atmosphere.

 

Users in Charge:

Leader: Dr Sachin Shinde
Deputy: Dr Adil Meersha

 

Technician in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

Acid Bench

 

This acid wet bench is used for graphene transfer, cleaning, and a number of other processes involving acids

 

Users in Charge:

Leader: Dr Osman Balci
Deputy: Ms Hamideh Ramezani

 

Technicians in Charge:

Leader: Mr Sergio Cacciola
Deputy: 

 

 

Solvent Bench

This solvent bench is used for cleaning, preparation of samples for deposition, etching, as well as any other operations requiring solvents.

 

Users in Charge:

Leader: Dr Osman Balci
Deputy: Ms Hamideh Ramezani

 

Technicians in Charge:

Leader: Mr Sergio Cacciola
Deputy: