CGC Class 1000 Cleanroom

Plasma-Enhanced Chemical Vapour Deposition system (PE-CVD)

Model: Vision 310, Advanced Vacuum AB

The plasma-enhanced chemical vapour deposition system is used for depositing amorphous Si, SiO₂ and Si₃N₄.
Gases connected: SiH₄, NH₃, N₂O, N₂

Users in Charge:

Leader: Mr Hao Chen
Deputy: Dr Dharmaraj Periyanagounder

Technical support: Lee Robinson

Reactive Ion Etcher (RIE-AV)

Model: Vision 320, Advanced Vacuum AB

Used for reactive-ion etching of Si, SiO₂ and Si₃N₄.
Gases connected: SF₆, CHF₃, C₄F₈, CF₄, O₂, Ar, N₂
Compatible only with the following substrate/mask materials:
Si, Al, PR, SiO₂, Si₃N₄ (exposed noble metal parts/masks are not allowed)

Users in Charge:

Leader: Chao Wen
Deputy: Dr Dharmaraj Periyanagounder

Inductively-Coupled Reactive Ion Etcher (RIE-ICP-AV)

Model: APEX SLR, Advanced Vacuum AB

A load-locked system for inductively-coupled reactive-ion etching of Si, SiO₂ and Si₃N₄ with an enhanced rate and anisotropicity.
Gases connected: SF₆, CHF₃, C₄F₈, CF₄, O₂, Ar, N₂
Compatible only with the following substrate/mask materials: 
Si, Al, PR, SiO₂, Si₃N₄ (exposed noble metal parts/masks are not allowed)

Users in Charge:

Leader: Chao Wen

Deputy: Dr Dharmaraj Periyanagounder

Reactive Ion Etcher (RIE-Nano)

Model: NanoEtch, Moorfield Nanotechnology Ltd

The tool implements a unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package.
Gases connected: CF₄, O₂, Ar, N₂

Users in Charge:

Leader: : Dr Dharmaraj Periyanagounder

Deputy : Lu Chen

Plasma Cleaner (RIE-Femto)

Model: Femto, Diener Electronics GmbH

This is a low-pressure plasma system used for plasma cleaning of substrates and activating surfaces.

Gases connected: O₂, N₂

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder

Deputy: Sohail Abbas

Electron-beam Evaporator (Evap-LEV)

Model: PVD 200 Pro, Kurt J. Lesker

This PVD tool is used for e-beam evaporation of metals and dielectrics.
Materials: Au, Cr, Ti, Al, SiO₂, Al₂O₃

Users in Charge:

Main: Dr Yang Li

Deputy: Dr Hamideh Ramezani

Electron-beam Evaporator (Evap-IndEV)

Model: Nexdep, Angstrom Engineering

This PVD tool is used for low-melting point metals as well as general materials for contacts' deposition.
Materials: In, Au, Pt, Pd, Ti

Users in Charge:

Leader: Dr Yan Wang

Deputy:Dr Dharmaraj Periyanagounder

Thermal Evaporator (Evap-TEV)

Model: MiniLab 60, Moorfield Nanotechnology Ltd

Manual and Automatic process modes, HMI, used for a thermal evaporation of selected metals.
Materials: Au, Ag, Cr, Al

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder
Deputy: Lu Chen

Plasma-Enhanced Atomic Layer Deposition (PE-ALD)

Model: Fiji, Veeco

Used for Plasma-Enhanced Atomic Layer Deposition of Al₂O₃, TiO₂, HfO2

Users in Charge:

Leader: Dr Yang Li

Deputy: Lu Chen

Ar-filled Glovebox (Evap-GB + Robot-GB)

Model: M-Braun

Inert-atmosphere (Ar) glovebox with a robotized 3D graphene transfer system and a thermal evaporator. The thermal evaporator can be accessed from the inside as well as outside of the glovebox. There is a spinner and a hotplate inside.

Users in Charge:

Leader: Mr Hao Chen

Deputy: Dr Yang Li

Graphene Chemical Vapour Deposition (CVD-G)

Model: Graphene Square

This chemical vapor deposition system is used to produce graphene films.

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder
Deputy: Lu Chen

Transition-Metal Dichalcogenides Chemical Vapour Deposition (CVD-TMD)

Model: PlanarGROW-2S

A Dual-Furnace Chemical Vapour Deposition system for growth of 2D transition-metal dichalcogenides (WS, WSe2).

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder

Deputy: Lu Chen

Plasma-Enhanced Chemical Vapour Deposition - Graphene (PE-CVD-G)

Model: PlanarGROW-4S

Plasma-Enhanced Chemical Vapour Deposition system for growth of high-quality graphene.

Users in Charge:

Leader: Hao Chen

Deputy: Dr Dharmaraj Periyanagounder

Boron-Nitride Chemical Vapour Deposition (CVD-hBN)

Model: Planartech

h-BN Chemical Vapour Deposition system for growth of Boron Nitride film

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder

Deputy: Lu Chen

Transfer System x2

Model: Nikon Eclipse LV200

The tool is equipped with micro-manipulators and is based on Nikon Eclipse microscope

Users in Charge:

Leader: Mr Hao Chen

Deputy: Chao Wen

Furnace Tube – Ar/H₂, N₂/H₂

Model: GTF-1200X

Tube furnace for the annealing processes up to 1100C in the 95% Argon/ 5% Hydrogen atmosphere.

Furnace Tube – O₂ Annealing

Model: GTF-1200X

Tube furnace for the annealing processes up to 1100C in the Forming Gas atmosphere.

Users in Charge:

Leader:  Dr Dharmaraj Periyanagounder
Deputy: Lu Chen

Acid Bench

This acid wet bench is used for graphene transfer, cleaning, and a number of other processes involving acids

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder
Deputy: Lu Chen

Solvent Bench

This solvent bench is used for cleaning, preparation of samples for deposition, etching, as well as any other operations requiring solvents.

Users in Charge:

Leader: Dr Dharmaraj Periyanagounder
Deputy:  Lu Chen

Vaccum Oven

Model: xxxxxx

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Users in Charge:

Leader: xxxxx
Deputy: xxxxx

Aixtron CCS2D MOCVD (Awaiting commission)

Model: CCS2D 19X2''

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Users in Charge:

Leader: Dr Dharmaraj Periyanagounder
Deputy: xxxxx