Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.
Please use the booking system to use the equipment.
Electron-Beam Lithography (Royce EBL Suite) Model: EBPG 5200, Raith GMBH A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters. Users in charge: |
Laser WriterPrincipal User: Matteo Tiberi Model: LW-405B+, Microtech Srl
Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron.
|
NanoimprinterDeputy User: Matteo Tiberi
Model: Obducat Eitre 6 with UV curing option. The tool is used for high resolution nanoimprinting.
|
Resist Preparation wetbenchThe wetbench is equipped with three spinners and four precision hotplates from EMS.
Processes available: - SU-8 negative photo-resists - AZ/LOR positive and negative photo-resists - PMMA/ZEP e-beam resists
Principal User: Matteo Tiberi Deputy User: Chao Wen |
Development and Cleaning wetbenchThis wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)
Principal User: Matteo Tiberi |
|
Acid and HF WetBench
Leader: Dr Jincan Zhang Deputy: Matteo Tiberi
|
Triple FurnacePrincipal User: Dr Jincan Zhang Deputy User: Chao Wen The tool is used for deep oxidation of Si
|
