Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.
Please use the booking system to use the equipment.
Electron-Beam Lithography (Royce EBL Suite)
A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters. Users in charge: |
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Laser WriterModel: LW-405B+, Microtech Srl
Users in charge: |
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NanoimprinterModel: Obducat Eitre 6 with UV curing option. The tool is used for high resolution nanoimprinting. Users in charge: |
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Resist Preparation wetbenchThe wetbench is equipped with three spinners and four precision hotplates from EMS.
Processes available: - SU-8 negative photo-resists - AZ/LOR positive and negative photo-resists - PMMA/ZEP e-beam resists |
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Development and Cleaning wetbenchThis wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)
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HF Acid bench |
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