Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.
Please use the booking system to use the equipment.
Electron-Beam Lithography (Royce EBL Suite) Model: EBPG 5200, Raith GMBH A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters. Users in charge: |
Laser WriterPrincipal User: Dr Hamideh Ramezani Model: LW-405B+, Microtech Srl
Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron.
|
NanoimprinterDeputy User:
Model: Obducat Eitre 6 with UV curing option. The tool is used for high resolution nanoimprinting.
|
Resist Preparation wetbenchThe wetbench is equipped with three spinners and four precision hotplates from EMS.
Processes available: - SU-8 negative photo-resists - AZ/LOR positive and negative photo-resists - PMMA/ZEP e-beam resists
Principal User: Dr Dharmaraj Periyanagounder Deputy User: Lu Chen |
Development and Cleaning wetbenchThis wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)
Principal User: Dr Dharmaraj Periyanagounder Deputy User: Lu Chen |
|
Acid and HF WetBench
Leader: Dr Dharmaraj Periyanagounder Deputy: Lu Chen
|
Triple FurnacePrincipal User:Chao Wen Deputy User:Dr Dharmaraj Periyanagounder The tool is used for deep oxidation of Si
|
Park AFM NX20Principal User: Dr. Yang Li Deputy User: Mr. Sohail Abbas The Park AFM NX20 is a high-resolution atomic force microscope (AFM) designed for precise nanoscale imaging and analysis. It features advanced non-contact mode technology, automated operation, and low-noise performance, making it ideal for materials science, nanotechnology, and life sciences research. Sample Size: Up to 200 mm (8 inches)
|