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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials
 

Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.

Please use the booking system to use the equipment.

 

Electron-Beam Lithography (Royce EBL Suite)

ROYCE

Model: EBPG 5200, Raith GMBH

A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters.

Users in charge:

Mr Jonathan Griffiths

Laser Writer

Principal User: Dr Hamideh Ramezani

Deputy UserChao Wen

Model: LW-405B+, Microtech Srl

 

Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron.

 

 

Nanoimprinter

Principal UserChao Wen

Deputy User

 

Model: Obducat Eitre 6 with UV curing option.

The tool is used for high resolution nanoimprinting. 

 

Resist Preparation wetbench

The wetbench is equipped with three spinners and four precision hotplates from EMS.

 

Processes available:

- SU-8 negative photo-resists

- AZ/LOR positive and negative photo-resists

- PMMA/ZEP e-beam resists

 

Principal UserDr Dharmaraj Periyanagounder

Deputy User: Lu Chen

Development and Cleaning wetbench

This wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)

 

 

Principal UserDr Dharmaraj Periyanagounder

Deputy User: Lu Chen

Acid and HF WetBench

 

 

Leader: Dr Dharmaraj Periyanagounder

Deputy: Lu Chen

 

 

 

Triple Furnace

Principal User:Chao Wen

Deputy User:Dr Dharmaraj Periyanagounder

The tool is used for deep oxidation of Si

 

 

 

Park AFM NX20 

Principal User: Dr. Yang Li

Deputy UserMr. Sohail Abbas

The Park AFM NX20 is a high-resolution atomic force microscope (AFM) designed for precise nanoscale imaging and analysis. It features advanced non-contact mode technology, automated operation, and low-noise performance, making it ideal for materials science, nanotechnology, and life sciences research. 

Sample Size: Up to 200 mm (8 inches)

 

 

SUSS Mask and Bond Aligner MA/BA8 GEN4 (not bookable yet)

Principal User: TBD

Deputy User: TBD

The MA/BA Gen4 MA/BA8 delivers exceptional process results through its advanced automation. Features such as constant dose mode, an automated exposure time control unit, and auto-alignment optimize process parameters for enhanced precision. Equipped with the high-performance MO Exposure Optics system, it ensures ideal exposure conditions for superior outcomes. Additionally, its sophisticated mechanical design enhances adjustment accuracy, with a specially engineered top- and bottom-side microscope unit (TSA and BSA) that minimizes TSA microscope travel and reduces vibrations for improved stability.

Our system is equipped with the TSA option.

Wafer size: 1'', 2'', 6'', 8''