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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials

Studying at Cambridge


CGC Class 100 Cleanroom

Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.

Please use the booking system to use the equipment.


Electron-Beam Lithography (Royce EBL Suite)


Model: EBPG 5200, Raith GMBH

A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters.

Users in charge:

Mr Jonathan Griffiths

Laser Writer

Model: LW-405B+, Microtech Srl

Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron.

Users in charge:



Model: Obducat Eitre 6 with UV curing option.

The tool is used for high resolution nanoimprinting. 

Users in charge:

Dr Yury Alaverdyan

Resist Preparation wetbench

The wetbench is equipped with three spinners and four precision hotplates from EMS.


Processes available:

- SU-8 negative photo-resists

- AZ/LOR positive and negative photo-resists

- PMMA/ZEP e-beam resists

Development and Cleaning wetbench

This wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)


HF Acid bench

Triple Furnace

The tool is used for deep oxidation of Si

Users in charge: