Electron-Beam Lithography (Royce EBL Suite)

Model: EBPG 5200, Raith GMBH

(will be available in January 2018)

A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch waters.

Laser Writer

Model: LW-405B+, Microtech Srl

Available for use.

Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron.

Nanoimprinter

Model: Obducat Eitre 6 with UV curing option.

Will be available in October 2017.

The tool is used for high resolution nanoimprinting. 

Resist Preparation wetbench

The wetbench is equipped with three spinners and four precision hotplates from EMS.

Available for use.

Processes available:

- SU-8 negative photo-resists

- AZ/LOR positive and negative photo-resists

- PMMA/ZEP e-beam resists

Development and Cleaning wetbench

This wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)

Available for use.

HF Acid bench

Triple Furnace

The tool is used for deep oxidation of Si

Will be available for use in January 2018.