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Cambridge Graphene Centre

Research Centre on Graphene, Layered Crystals and Hybrid Nanomaterials
 

Below, you can find the list of equipment available in Class 100 Cleanroom. A few are already available for use, others are being installed and will become available later.

Please use the booking system to use the equipment.

 

Electron-Beam Lithography (Royce EBL Suite)

ROYCE

Model: EBPG 5200, Raith GMBH

A state-of-the-art high-resolution/throughput Electron-Beam Lithography system capable of exposing 8-inch wafers.

Users in charge: Mr Jonathan Griffiths

Laser Writer

Principal User: Dr Hamideh Ramezani

Deputy UserChao Wen

Model: LW-405B+, Microtech Srl

 

Used for the direct-write contactless optical lithography. Available wavelengths: 385 and 405nm. Best resolution (linewidth) is 0.6micron.

 

 

Nanoimprinter

Principal UserChao Wen

Deputy User

 

Model: Obducat Eitre 6 with UV curing option.

The tool is used for high resolution nanoimprinting. 

 

Resist Preparation wetbench

The wetbench is equipped with three spinners and four precision hotplates from EMS.

 

Processes available:

- SU-8 negative photo-resists

- AZ/LOR positive and negative photo-resists

- PMMA/ZEP e-beam resists

 

Principal UserDr Dharmaraj Periyanagounder

Deputy User: Lu Chen

Development and Cleaning wetbench

This wetbench is used for preparation of samples for lithography, as well post-processing (development, etc.)

 

 

Principal UserDr Dharmaraj Periyanagounder

Deputy User: Lu Chen

Acid WetBench

 

 

Leader: Dr Dharmaraj Periyanagounder

Deputy: Lu Chen

 

 

 

Triple Furnace

Principal User:Chao Wen

Deputy User:Dr Dharmaraj Periyanagounder

The tool is used for deep oxidation of Si

 

 

 

Park AFM NX20 

Principal User: Dr. Yang Li

Deputy UserMr. Sohail Abbas

AFM Mode: 

Electrostatic Force Microscopy

Dr. Yang Li, Lu Chen

Kelvin Probe Force Microscopy

Dr. Yang Li, Mr. Sohail Abbas

Piezoresponse Force Microscopy

Dr. Yang Li, Petros Symeon

Magnetic Force Microscopy 

Dr. Yang Li, Mr. Sohail Abbas

Non-contact Mode

Dr. Yang Li, Mr. Sohail Abbas

Tapping Mode

Dr. Yang Li, Mr. Sohail Abbas

The Park AFM NX20 is a high-resolution atomic force microscope (AFM) designed for precise nanoscale imaging and analysis. It features advanced non-contact mode technology, automated operation, and low-noise performance, making it ideal for materials science, nanotechnology, and life sciences research. 

Sample Size: Up to 200 mm (8 inches)

 

 


SUSS Mask and Bond Aligner MA/BA8 GEN4 (not bookable yet)

Principal User: TBD

Deputy User: TBD

The MA/BA Gen4 MA/BA8 delivers exceptional process results through its advanced automation. Features such as constant dose mode, an automated exposure time control unit, and auto-alignment optimise process parameters for enhanced precision. Equipped with the high-performance MO Exposure Optics system, it ensures ideal exposure conditions for superior outcomes. Additionally, its sophisticated mechanical design enhances adjustment accuracy, with a specially engineered top- and bottom-side microscope unit (TSA and BSA) that minimises TSA microscope travel and reduces vibrations for improved stability.

Our system is equipped with the TSA option.

Wafer size: 1'', 2'', 6'', 8''